The Si rotaty target is using Plasma spraying or sintering binding process,the size is according to customer requirements.
The Si planar target is using crystal pulling process, the size is according to customer requirements.
Relative density：＞99%
The purity：99.99-99.999%
Application field：Thin-film Photovoltaic Iindustry、Flat Display Industry、LOW-E Glass Industry、Optical Coating Industry、Decortive & Tools Coating Industry
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